Ion/Electron sources Comparison Table
| Model |
IQE 11/35 |
FDG 150 (Focus) |
FDG 15 (Focus) |
FG 22/35 |
EQ 22/35 Electron Source |
| Summary |
Exractor Type Ion Source optimized
for Sample Cleaning |
Fine focus scanning ion source |
Variable focus ion source |
Low Energy Electron Source for Sample Neutralization |
Small Spot Electron Source for
AES, SEM/SAM, EELS and more |
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| Operation |
| Ion/Electron Current |
up to 20 µA (Ar) |
> 15 µA (at 5 keV and 50 mm WD)
> 1 µA (at 50 eV) |
> 15 µA (at 5 keV and 50 mm WD)
> 1 µA (at 50 eV) |
> 1 µA |
> 100 µA |
| Ion/Electron Energy |
200 eV - 5 keV |
10 eV - 5 keV |
10 eV - 5 keV |
0-500 eV |
20 eV - 5 keV |
| Operating Gases |
Various |
Ar and other noble gases, H2, O2 |
Ar and other noble gases, H2, O2 |
- |
- |
| Scannable |
- |
yes |
no |
- |
yes |
| Working Principle |
Extractor type |
Extractor type with floating column |
Extractor type with floating column |
- |
- |
| Applications |
Sample Cleaning
Implantation |
- Depth profiling
- Charge compensation
- Wide energy range sputter cleaning of semiconductors and metals |
- Charge compensation
- Wide energy range sputter cleaning of semiconductors and metals |
XPS, AES, SIMS |
AES, SEM, SAM, REELS |
| Required Accessories |
Gas inlet |
Gas inlet |
Gas inlet |
- |
- |
| Optional Accessories |
- |
Differential pumping |
Differential pumping |
- |
Microformed filament (LaB6)
Pulsed operation with beam chopper |
| Performance |
| Scan Range |
- |
up 10 mm x 10 mm
(at 5 keV and 50 mm WD) |
- |
- |
±5 mm at 32 mm |
| Spot size |
< 5 mm at 30 mm working distance |
< 150 µm (at 5 keV and 50 mm WD) |
< 300 µm (at 5 keV and 50 mm WD) |
15-25 mm at 40 mm |
50 μm at 5 kV |
| Mounting |
| Insertion Depth |
62.5 mm, 120 mm, 190 mm, 250 mm |
224 mm |
173 mm |
146 mm |
166 mm |
| Mounting Flange |
DN 35 CF (2.75 ") |
DN 40 CF |
DN 40 CF |
DN 35 CF (2.75”) |
DN 35 CF (2.75”) |
| Power Supply |
COSCON IS |
- |
- |
COSCON FG |
PU-EQ 22 |
| Working Distance |
- |
- |
- |
40 mm |
20 mm |
